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The Thickogram: a method for easy film thickness measurement in XPS
Author(s) -
Cumpson Peter J
Publication year - 2000
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/1096-9918(200006)29:6<403::aid-sia884>3.0.co;2-8
Subject(s) - x ray photoelectron spectroscopy , substrate (aquarium) , range (aeronautics) , kinetic energy , materials science , simple (philosophy) , analytical chemistry (journal) , optics , computer science , chemistry , composite material , physics , chemical engineering , engineering , geology , organic chemistry , philosophy , oceanography , epistemology , quantum mechanics
We describe a simple graphical method for measuring film thickness by XPS, which we call a Thickogram. This method can be used even when the film and substrate peaks have very different kinetic energies and incorporates the effects of elastic scattering within the recommended range of take‐off angles. The Thickogram may also be useful when measuring film thickness by AES, though this is less commonly required than in XPS. Copyright © 2000 John Wiley & Sons, Ltd.