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Spectroscopic Ellipsometry: a Non‐destructive Technique for Surface Analysis
Author(s) -
Schram T.,
Franquet A.,
Terryn H.,
Vereecken J.
Publication year - 1999
Publication title -
advanced engineering materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.938
H-Index - 114
eISSN - 1527-2648
pISSN - 1438-1656
DOI - 10.1002/(sici)1527-2648(199909)1:1<63::aid-adem63>3.0.co;2-1
Subject(s) - ellipsometry , materials science , characterization (materials science) , thin film , infrared , surface (topology) , analytical chemistry (journal) , optics , nanotechnology , chemistry , chromatography , physics , geometry , mathematics
New spectroscopic ellipsometry techniques are very promising for the non‐destructive surface analysis of thin films on metals. Infrared spectroscopic ellipsometry allows the morphological and chemical characterization of these films, and recent results are presented here.