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Improvement of the oxidation resistance of gamma titanium aluminides by microalloying with chlorine using ion implantation
Author(s) -
Schumacher G.,
Lang C.,
Schütze M.,
Hornauer U.,
Richter E.,
Wieser E.
Publication year - 1999
Publication title -
materials and corrosion
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 55
eISSN - 1521-4176
pISSN - 0947-5117
DOI - 10.1002/(sici)1521-4176(199903)50:3<162::aid-maco162>3.0.co;2-o
Subject(s) - chlorine , kinetics , chemistry , nuclear chemistry , titanium , metallurgy , polymer chemistry , materials science , organic chemistry , physics , quantum mechanics
High oxidation resistance of gamma titanium aluminides can be achieved by the formation of a continuous scale of slowly growing Al 2 O 3 . The formation of such a scale was stimulated by the addition of small amounts of chlorine. The additions were incorporated by ion implantation into the sample. The γ‐TiAl samples were oxidized at 1173 K in air for 100 h. Even if chlorine is present in very small quantities, it has a highly beneficial effect on the oxidation resistance (microalloying effect). The kinetics are changed from mixed TiO 2 /Al 2 O 3 ‐ kinetics for unimplanted specimens to pure Al 2 O 3 ‐ kinetics for chlorine implanted specimens.