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Wet Chemical UV Oxidation of 2‐Fluorophenol Optimization with Chosen Reaction Parameters
Author(s) -
Kreisel G.,
Schmidt M.
Publication year - 1999
Publication title -
chemical engineering and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.403
H-Index - 81
eISSN - 1521-4125
pISSN - 0930-7516
DOI - 10.1002/(sici)1521-4125(199912)22:12<1001::aid-ceat1001>3.0.co;2-m
Subject(s) - oxidation process , process (computing) , chemistry , volume (thermodynamics) , redox , process optimization , reaction conditions , process engineering , chemical engineering , organic chemistry , catalysis , thermodynamics , computer science , engineering , physics , operating system
In the last years, a multitude of different methods for treating contaminated liquid wastes have been investigated. However, most conventional treatment methods have proven to be ineffective or connected with unavoidable problems. In the present paper, an empirical process model for a photochemical oxidation is described. It is designed to determine the influence of various parameters, such as temperature, pH level, volume flow and amount of oxidation substance, on the reaction process. The accuracy of the model is demonstrated by comparison of experimental and calculated results.