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Investigation of the Photo‐Assisted Adsorption of Gases on Irradiated Titanium Dioxide
Author(s) -
Bredemeyer Niels,
Hesse Diethard
Publication year - 1999
Publication title -
chemical engineering and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.403
H-Index - 81
eISSN - 1521-4125
pISSN - 0930-7516
DOI - 10.1002/(sici)1521-4125(199907)22:7<580::aid-ceat580>3.0.co;2-5
Subject(s) - catalysis , irradiation , adsorption , titanium dioxide , decomposition , photocatalysis , oxygen , photochemistry , titanium , chemistry , materials science , chemical engineering , inorganic chemistry , organic chemistry , composite material , physics , nuclear physics , engineering
As reported in a recent study, NO can decompose on an irradiated surface of TiO 2 as the catalyst in the presence of oxygen. It was observed, however, that the reaction system did not reach a steady state, which was interpreted as a deactivation of the photocatalyst caused by the strongly adsorbed O and N atoms formed during the NO decomposition. The catalyst quickly deactivated in the absence of oxygen. TPD‐measurements with deactivated material led to the assumption that NO itself is chemisorbed very strongly on the irradiated semiconductor surface.