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From Mesoscopic to Nanoscopic Surface Structures: Lithography with Colloid Monolayers
Author(s) -
Burmeister Frank,
Schäfle Claudia,
Keilhofer Bettina,
Bechinger Clemens,
Boneberg Johannes,
Leiderer Paul
Publication year - 1998
Publication title -
chemical engineering and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.403
H-Index - 81
eISSN - 1521-4125
pISSN - 0930-7516
DOI - 10.1002/(sici)1521-4125(199809)21:9<761::aid-ceat761>3.0.co;2-y
Subject(s) - monolayer , mesoscopic physics , lithography , nanotechnology , nanoscopic scale , colloid , materials science , substrate (aquarium) , self assembly , chemistry , optoelectronics , physics , organic chemistry , condensed matter physics , oceanography , geology
Colloid monolayer lithography is briefly reviewed and demonstrated to be a powerful alternative technique for the nanostructuring of surfaces. The Figure shows a colloid monolayer viewed through a TEM grid used to transport the monolayer to the desired substrate. The monolayer and grid together form a lithographic mask that can later be removed to leave, for example, a pattern of deposited gold dots.