From Mesoscopic to Nanoscopic Surface Structures: Lithography with Colloid Monolayers | Zendy

Burmeister Frank | Zendy; Schäfle Claudia | Zendy; Keilhofer Bettina | Zendy; Bechinger Clemens | Zendy; Boneberg Johannes | Zendy; Leiderer Paul | Zendy

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From Mesoscopic to Nanoscopic Surface Structures: Lithography with Colloid Monolayers

Author(s) -

Burmeister Frank,

Schäfle Claudia,

Keilhofer Bettina,

Bechinger Clemens,

Boneberg Johannes,

Leiderer Paul

Publication year - 1998

Publication title -

chemical engineering and technology

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.403

H-Index - 81

eISSN - 1521-4125

pISSN - 0930-7516

DOI - 10.1002/(sici)1521-4125(199809)21:9<761::aid-ceat761>3.0.co;2-y

Subject(s) - monolayer , mesoscopic physics , lithography , nanotechnology , nanoscopic scale , colloid , materials science , substrate (aquarium) , self assembly , chemistry , optoelectronics , physics , organic chemistry , condensed matter physics , oceanography , geology

Colloid monolayer lithography is briefly reviewed and demonstrated to be a powerful alternative technique for the nanostructuring of surfaces. The Figure shows a colloid monolayer viewed through a TEM grid used to transport the monolayer to the desired substrate. The monolayer and grid together form a lithographic mask that can later be removed to leave, for example, a pattern of deposited gold dots.

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