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DLR‐Jet REMPI – Ultrasensitive Monitor for Process Control in Thermal Processes
Author(s) -
Oser Harald,
Thanner Reinhold,
Grotheer HorstHenning
Publication year - 1998
Publication title -
chemical engineering and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.403
H-Index - 81
eISSN - 1521-4125
pISSN - 0930-7516
DOI - 10.1002/(sici)1521-4125(199806)21:6<487::aid-ceat487>3.0.co;2-q
Subject(s) - jet (fluid) , sensitivity (control systems) , line (geometry) , thermal , spectrometer , process (computing) , selectivity , materials science , nuclear engineering , optics , analytical chemistry (journal) , mechanics , chemistry , physics , engineering , chromatography , computer science , meteorology , electronic engineering , geometry , biochemistry , mathematics , catalysis , operating system
Process control requires sensitive and selective on‐line monitors for species concentrations. Current REMPI mass spectrometers are suitable instruments in terms of selectivity and on‐line capability but, generally, their sensitivities are too low. The DLR‐Jet REMPI geometry, by contrast, provides a very high sensitivity without loss in selectivity or on‐line capability. A series of tests and their results show that Jet REMPI can be made an instrument suitable for industrial use.