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Generation of Surface Amino Groups on Aromatic Self‐Assembled Monolayers by Low Energy Electron Beams—A First Step Towards Chemical Lithography
Author(s) -
Eck W.,
Stadler V.,
Geyer W.,
Zharnikov M.,
Gölzhäuser A.,
Grunze M.
Publication year - 2000
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/(sici)1521-4095(200006)12:11<805::aid-adma805>3.0.co;2-0
Subject(s) - monolayer , nitro , materials science , self assembled monolayer , trifluoroacetic anhydride , trifluoroacetic acid , irradiation , electron , acylation , surface energy , lithography , photochemistry , electron beam lithography , resist , polymer chemistry , organic chemistry , nanotechnology , chemistry , layer (electronics) , alkyl , optoelectronics , composite material , catalysis , physics , quantum mechanics , nuclear physics
Chemically defined surface patterning has been achieved via irradiation with low‐energy electrons. Irradiation of nitro‐arene‐thiol monolayers leads to the reduction of the nitro groups to amino groups, which can then be further chemically modified. The Figure shows such a monolayer that was irradiated through a copper grid followed by acylation with trifluoroacetic acid anhydride.