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Nanoscopic Templates from Oriented Block Copolymer Films
Author(s) -
ThurnAlbrecht T.,
Steiner R.,
DeRouchey J.,
Stafford C. M.,
Huang E.,
Bal M.,
Tuominen M.,
Hawker C. J.,
Russell T. P.
Publication year - 2000
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/(sici)1521-4095(200006)12:11<787::aid-adma787>3.0.co;2-1
Subject(s) - copolymer , materials science , nanoscopic scale , nanoporous , polystyrene , template , nanostructure , irradiation , nanotechnology , chemical engineering , polymer chemistry , composite material , polymer , physics , nuclear physics , engineering
Ordered nanoporous films have been generated via selective degradation of self‐assembled block copolymer films of polystyrene (PS) and poly(methylmethacrylate) (PMMA), which contain oriented cylindrical microdomains. Deep UV irradiation degrades the PMMA, which can be rinsed away, leaving an ordered array of circular holes in a film of cross‐linked PS (see Figure).