Premium
“Constructive Nanolithography”: Inert Monolayers as Patternable Templates for In‐Situ Nanofabrication of Metal–Semiconductor–Organic Surface Structures—A Generic Approach
Author(s) -
Maoz R.,
Frydman E.,
Cohen S. R.,
Sagiv J.
Publication year - 2000
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/(sici)1521-4095(200005)12:10<725::aid-adma725>3.0.co;2-z
Subject(s) - nanolithography , materials science , template , monolayer , silane , silicon , nanotechnology , silanes , semiconductor , inert , fabrication , optoelectronics , organic chemistry , chemistry , medicine , alternative medicine , pathology , composite material
Tip‐induced nanoelectrochemical oxidation is used to pattern methyl‐terminated silane monolayers on silicon via oxidation of their top CH 3 groups in the process known as constructive nanolithography. These authors report the utility of such “inert” monolayers as extremely versatile templates for constructing a rich variety of patterns such as the particulate cadmium sulfide features shown in the Figure.