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Reactively Sputter‐Deposited Titanium Oxide Coatings with Parallel Penniform Microstructure
Author(s) -
Rodríguez J.,
Gómez M.,
Lu J.,
Olsson E.,
Granqvist C.G.
Publication year - 2000
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/(sici)1521-4095(200003)12:5<341::aid-adma341>3.0.co;2-0
Subject(s) - materials science , microstructure , sputtering , titanium oxide , oxide , titanium , substrate (aquarium) , sputter deposition , rendering (computer graphics) , titanium dioxide , electrochemistry , thin film , metallurgy , nanotechnology , optoelectronics , chemical engineering , electrode , computer graphics (images) , engineering , oceanography , chemistry , geology , computer science
Ordered titanium dioxide films with large and controllable microstructure have been prepared by a low temperature sputtering deposition method. The Figure displays the “parallel penniform” structure of the films, which have very large surface area and excellent contact to the underlying substrate, rendering them potentially important for electrochemical and photoelectrochemical applications.