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Plowing on the Sub‐50nm Scale: Nanolithography Using Scanning Force Microscopy
Author(s) -
Kunze U.,
Klehn B.
Publication year - 1999
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/(sici)1521-4095(199912)11:17<1473::aid-adma1473>3.0.co;2-h
Subject(s) - nanolithography , dip pen nanolithography , materials science , lithography , scanning force microscopy , scanning probe microscopy , substrate (aquarium) , etching (microfabrication) , nanotechnology , atomic force microscopy , scanning electron microscope , isotropic etching , microscopy , optics , optoelectronics , composite material , fabrication , medicine , oceanography , alternative medicine , physics , pathology , layer (electronics) , geology
A new nanolithography technique based on mechanical surface deformation with the tip of a scanning force microscope is reported here. In the lithographic step, the furrow is dynamically plowed into the substrate (see Figure). The pattern transfer is then carried out in a separate wet chemical etching step, thus preserving the tip. The technique can provide linewidths as narrow as 20 nm.