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Ultra‐Thin Zeolite Films Through Simple Self‐Assembled Processes
Author(s) -
Cho Gyoujin,
Lee JaeSuk,
Glatzhofer Daniel T.,
Fung Bing M.,
Yuan Wie Lei,
O'Rear Edgar A.
Publication year - 1999
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/(sici)1521-4095(199904)11:6<497::aid-adma497>3.0.co;2-z
Subject(s) - materials science , zeolite , monolayer , wafer , thin film , nanotechnology , colloid , amphiphile , silicon , aqueous solution , membrane , chemical engineering , nanosheet , organic chemistry , optoelectronics , copolymer , polymer , composite material , catalysis , chemistry , engineering , biology , genetics
Zeolite thin films are very promising as highly selective separation membranes, sensors, conductors, and optoelectronic devices, and a wide variety of methods for their preparation have been reported. In this report, the authors describe their recent use of self‐assembled monolayer techniques to prepare ultra‐thin films of zeolites on silicon wafers. In an aqueous colloidal solution of zeolite particles, an array of the amphiphilic hexanoic acid could induced deposition of a zeolite film through hydrophobic interactions. The method was found to be simpler and less expensive than those previously reported.