Premium
Micellar Inorganic–Polymer Hybrid Systems—A Tool for Nanolithography
Author(s) -
Spatz Joachim P.,
Herzog Thomas,
Mößmer Stefan,
Ziemann Paul,
Möller Martin
Publication year - 1999
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/(sici)1521-4095(199902)11:2<149::aid-adma149>3.0.co;2-w
Subject(s) - nanolithography , micelle , materials science , polymer , copolymer , nanotechnology , etching (microfabrication) , nanoparticle , self assembly , lithography , dip pen nanolithography , chemical engineering , optoelectronics , organic chemistry , composite material , fabrication , chemistry , aqueous solution , medicine , alternative medicine , pathology , engineering , layer (electronics)
A approach to nanolithography based on the self‐assembly and formation of mono‐micellar films of a diblock‐copolymer is reported. The Figure shows the formation of islands using an inorganically modified micellar mask. Au 3+ in the micelles leads to islands while the formation of a Au‐nanoparticle in each single micelle results in holes, owing to an inversion of the etching rate.