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Fabrication of Silicon MOSFETs Using Soft Lithography
Author(s) -
Jeon Noo Li,
Hu Junmin,
Whitesides GeorgeM.,
Erhardt Martin K.,
Nuzzo Ralph G.
Publication year - 1998
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/(sici)1521-4095(199812)10:17<1466::aid-adma1466>3.0.co;2-5
Subject(s) - materials science , fabrication , photolithography , soft lithography , lithography , silicon , nanotechnology , mosfet , field effect transistor , transistor , optoelectronics , electrical engineering , engineering , medicine , alternative medicine , pathology , voltage
Fabrication of metal‐oxide semiconductor field‐effect transistors (MOSFETs) in silicon using processes in which MIMIC (micromolding in capillaries—a soft lithographic technique) rather than photolithography is used is described. The Figure shows a micrograph of an array of p‐MOSFETs obtained from this process. This demonstrates that MIMIC is compatible with Si fabrication processes, and its application is not limited to single‐level processes.