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Microstructuring of Molecularly Thin Polymer Layers by Photolithography
Author(s) -
Prucker Oswald,
Schimmel Martin,
Tovar Günter,
Knoll Wolfgang,
Rühe Jürgen
Publication year - 1998
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/(sici)1521-4095(199810)10:14<1073::aid-adma1073>3.0.co;2-d
Subject(s) - materials science , photolithography , photopolymer , polystyrene , polymer , fabrication , substrate (aquarium) , nanotechnology , thin film , adhesion , lithography , optoelectronics , polymerization , composite material , medicine , oceanography , alternative medicine , pathology , geology
Laterally structured ultrathin polymer films attached to solid surfaces can be obtained using photolithographic techniques developed for electronic device fabrication. The Figure shows a surface plasmon (SP) microscopy image of a structured polystyrene (PS) film of 21.5 nm thickness prepared by photopolymerization. The authors report a strong adhesion of the polymer films to the substrate due to covalent linking.