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In Situ Deposition of Highly C‐axis Oriented Lanthanum Modified Lead Titanate Thin Films by Multi‐Ion‐Beam Reactive Co‐sputtering Technique
Author(s) -
Zhu J.,
Xiao D.,
Zhu J.,
Zen J.
Publication year - 1999
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/(sici)1521-4079(199909)34:8<989::aid-crat989>3.0.co;2-l
Subject(s) - sputtering , thin film , materials science , substrate (aquarium) , lanthanum , ion beam , analytical chemistry (journal) , lead titanate , in situ , polarization (electrochemistry) , ion , ferroelectricity , mineralogy , chemistry , inorganic chemistry , nanotechnology , dielectric , optoelectronics , oceanography , organic chemistry , chromatography , geology
Abstract Highly c‐axis oriented La‐modified PbTiO 3 (PLT) thin films were in situ grown on Pt(100)/MgO(100) and MgO(100) substrates by multi‐ion‐beam reactive co‐sputtering (MIBRECS) technique at the substrate temperature range of 450°C‐540°C. The orientation degree a of the films is more than 90%. The chemical composition is in good agreement with the designed one and is almost uniform across the surface of the substrates. The remanent polarization (P r ) and coercive field (E c ) were found to be 5.3 μC/cm 2 and 78 kV/cm, respectively.