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Structure and Optical Properties of dc Reactive Magnetron Sputtered Zinc Oxide Films
Author(s) -
Subramanyam T. K.,
Srinivasulu Naidu B.,
Uthanna S.
Publication year - 1999
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/(sici)1521-4079(199909)34:8<981::aid-crat981>3.0.co;2-g
Subject(s) - zinc , materials science , substrate (aquarium) , sputter deposition , cavity magnetron , transmittance , oxygen , argon , sputtering , oxide , thin film , band gap , partial pressure , deposition (geology) , metal , analytical chemistry (journal) , chemical engineering , inorganic chemistry , optoelectronics , chemistry , metallurgy , nanotechnology , paleontology , oceanography , organic chemistry , chromatography , sediment , biology , geology , engineering
Zinc oxide films were deposited on glass substrates in argon and oxygen atmosphere by dc reactive magnetron sputtering using a metallic zinc target. The influence of oxygen pressure and substrate temperature on the structure and optical properties of the films were systematically investigated and optimised the deposition parameters to prepare single phase zinc oxide films with preferred (002) orientation. At an optimum oxygen pressure of 1x10 ‐3 mbar and substrate temperature of 663 K, the films exhibited an optical transmittance of 83% with a band gap of 3.28 eV.