Premium
Emission Spectroscopy and Mie Scattering on an Inductively Coupled Plasma Torch
Author(s) -
Lins G.
Publication year - 2000
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/(sici)1521-3986(200004)40:1/2<147::aid-ctpp147>3.0.co;2-3
Subject(s) - materials science , inductively coupled plasma , plasma , cubic zirconia , analytical chemistry (journal) , flash evaporation , plasma torch , yttria stabilized zirconia , evaporation , argon , thermal spraying , composite material , coating , ceramic , chromatography , atomic physics , chemistry , physics , quantum mechanics , thermodynamics
Abstract Plasma flash evaporation uses an inductively generated thermal high‐power plasma to deposit films immediately out of the vapour phase of material introduced into the plasma as a powder. In an attempt to assess the suitability of the method for the deposition of yttria‐stabilised zirconia coatings, the plasma temperature was measured in the absence and in the presence of evaporating zirconia (ZrO 2 ) powder, and the evaporation behaviour was investigated by Mie scattering. It was found that hydrogen as an admixture to the plasma‐forming gas was superior to oxygen, because of its more favourable thermal conduction properties. When the plasma was loaded with ZrO 2 powder at a rate of 100 mg/min the temperature dropped by 2,000 K but remained still high enough for the existence of (ZrO 2 ) vapour. Finally, with an appropriate plasma composition, ZrO 2 powder with a maximum grain size not significantly exceeding 12 μ m could be completely evaporated at a powder feed rate of 180 mg/min.