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Investigation of Dense Argon Plasmas in a Simple Capillary Discharge
Author(s) -
Hildebrand A.,
Juschkin L.,
Kröger M.
Publication year - 2000
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/(sici)1521-3986(200004)40:1/2<130::aid-ctpp130>3.0.co;2-z
Subject(s) - argon , plasma , materials science , atomic physics , lasing threshold , capillary action , pinhole (optics) , electron density , electron , opacity , spectral line , ion , plasma diagnostics , physics , optics , optoelectronics , nuclear physics , wavelength , quantum mechanics , astronomy , composite material
In a simple capillary discharge with charging voltages as high as 35 kV dense argon plasmas were produced and studied displaying reproduceable mission of the 3 p — 3 s lines of the Ar ix ion. The obtained electron densities did not exceed 2 × 10 18 cm —3 , and no clear lasing was observed. Pinhole spectra and time resolved measurements of the electron density indicate that the compression of the plasma was too weak because of the slow current rise. Comparison with a faster discharge indicates that a minimum current rise of 0.6 × 10 12 A/s is needed to obtain sufficient compression and thus measurable gain on Ar ix 3 p — 3 s lines.