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Fabrication of Quantum Dots with Scanning Probe Nanolithography
Author(s) -
Keyser U.F.,
Schumacher H.W.,
Zeitler U.,
Haug R.J.,
Eberl K.
Publication year - 2001
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/(sici)1521-3951(200104)224:3<681::aid-pssb681>3.0.co;2-d
Subject(s) - nanolithography , fabrication , quantum dot , materials science , scanning tunneling microscope , nanotechnology , optoelectronics , dip pen nanolithography , heterojunction , transistor , quantum tunnelling , physics , voltage , medicine , alternative medicine , pathology , quantum mechanics
We are using an atomic force microscope for the direct fabrication of low‐dimensional quantum structures in GaAs/AlGaAs heterostructures. By combining mechanical nanolithography with current‐controlled local oxidation it is possible to design devices such as a single‐electron transistor with different shapes. In this step‐by‐step process the devices can be tested after every step of the nanolithography, which allows a very controlled fabrication of quantum dots. Here we present our experiments on systems with 2D‐0D‐2D and 2D‐1D‐2D tunneling characteristics.