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Synthesis and radical polymerization of pyrocarbonate‐functionalized monomers: application to positive‐tone photoresists
Author(s) -
Vansteenkiste Stefan,
Matthijs Gert,
Schacht Etienne,
Schrijver Frans De,
Damme Marc Van,
Vermeersch Joan
Publication year - 1999
Publication title -
macromolecular rapid communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.348
H-Index - 154
eISSN - 1521-3927
pISSN - 1022-1336
DOI - 10.1002/(sici)1521-3927(19990601)20:6<333::aid-marc333>3.0.co;2-v
Subject(s) - monomer , polymer chemistry , photoresist , polymerization , polymer , chemistry , methacrylate , materials science , organic chemistry , layer (electronics)
The synthesis of two new tert ‐butyl carbonic anhydride monomers, 4‐vinylbenzoic and methacrylic tert ‐butylcarbonic anhydride was achieved successfully. Radical polymerization at 45°C yielded tert ‐butyl pyrocarbonate protected materials. Thermographic analysis showed that both polymers decompose cleanly at 135°C. The lithographic performance of both materials was evaluated in the presence of 2,4,6‐tris‐(trichloromethyl)‐ s ‐triazine as photoacid generating species. It was demonstrated that the large polarity change results in a positively working chemically amplified photoresist system.