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Polymers for 193‐nm Microlithography: Regioregular 2‐Alkoxycarbonylnortricyclene Polymers by Controlled Cyclopolymerization of Bulky Ester Derivatives of Norbornadiene
Author(s) -
Niu Q. Jason,
Fréchet Jean M. J.
Publication year - 1998
Publication title -
angewandte chemie international edition
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.831
H-Index - 550
eISSN - 1521-3773
pISSN - 1433-7851
DOI - 10.1002/(sici)1521-3773(19980316)37:5<667::aid-anie667>3.0.co;2-h
Subject(s) - copolymer , polymer chemistry , maleic anhydride , polymer , monomer , substituent , norbornadiene , aqueous solution , materials science , chemistry , photochemistry , organic chemistry , catalysis
Double duty for the tert ‐butyl residue: The bulky substituent in monomer 1 favors free‐radical cyclopolymerization with maleic anhydride to give the regioregular nortricyclene copolymer 2 . When the polymer is irradiated with a photoacid generator, the tert ‐butyl ester is cleaved and the polymer becomes soluble in aqueous base. This type of copolymer can be used in 193‐nm microlithography; images with resolutions of less than 200 nm have been obtained.