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Control of population of excited nitrogen molecules by mixing hydrogen in low pressure discharge
Author(s) -
Uematsu Katsuyuki,
Yumoto Motoshige,
Sakai Takao
Publication year - 1999
Publication title -
electrical engineering in japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.136
H-Index - 28
eISSN - 1520-6416
pISSN - 0424-7760
DOI - 10.1002/(sici)1520-6416(199909)128:4<1::aid-eej1>3.0.co;2-k
Subject(s) - excited state , metastability , hydrogen , quenching (fluorescence) , relaxation (psychology) , molecule , atomic physics , population , nitrogen , materials science , mixing (physics) , glow discharge , discharge pressure , analytical chemistry (journal) , chemistry , thermodynamics , physics , plasma , optics , fluorescence , organic chemistry , psychology , social psychology , demography , quantum mechanics , sociology , gas compressor
The authors studied surface treatment of PTFE by low pressure discharge. It is deduced that excited nitrogen molecules contribute to introduce polar components on the surface. To confirm the speculation, we tried to change the population of metastable nitrogen N 2 ( A 3 Σ u + ) by quenching precursor N 2 ( B 3 Π g ) with hydrogen molecules. A decrease of relaxation time which indicates a change of excited molecules measured by emission spectroscopy using a time‐after‐glow method was obtained. As a result, the relaxation times of N 2 ( B 2 Π g ) and N 2 ( A 3 Σ u + ) decreased to 55% and 20%, respectively, when the mixing ratio of hydrogen was 3%. It was also deduced that hydrogen atoms may take part in quenching of N 2 ( A 3 Σ u + ). © 1999 Scripta Technica, Electr Eng Jpn, 128(4): 1–8, 1999