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Microstructure evolution of hydrogenated silicon thin films
Author(s) -
Hwang H. L.,
Wang K. C.,
Hsu K. C.,
Yew T.R.,
Loferski J. J.
Publication year - 1996
Publication title -
progress in photovoltaics: research and applications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.286
H-Index - 131
eISSN - 1099-159X
pISSN - 1062-7995
DOI - 10.1002/(sici)1099-159x(199605/06)4:3<165::aid-pip119>3.0.co;2-m
Subject(s) - materials science , silicon , nanocrystalline silicon , polycrystalline silicon , microstructure , amorphous silicon , raman spectroscopy , hydrogen , microcrystalline , crystallite , solar cell , analytical chemistry (journal) , crystalline silicon , chemical vapor deposition , fourier transform infrared spectroscopy , thin film , amorphous solid , chemical engineering , nanotechnology , crystallography , optoelectronics , composite material , chemistry , optics , metallurgy , thin film transistor , physics , organic chemistry , engineering , layer (electronics) , chromatography
This paper describes the microstructure evolution of hydrogenated silicon films containing various amounts of hydrogen. Microcrystalline silicon films were produced when the hydrogen content of the films was adjusted by using the diluted hydrogen and hydrogen atom treatment methods. Polycrystalline silicon films having grain sizes in the micrometre range were deposited at low temperatures (250°C) by electron cyclotron resonance chemical vapour deposition with the hydrogen dilution method. The micro crystalline and polycrystalline films were characterized by NMR, FTIR, Raman, X‐ray and optical spectroscopy and electrical measurements. The results suggest the possibility of even larger grain silicon films suitable for high‐performance solar cells which avoid the fundamental difficulties of amorphous Si:H solar cells.