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Tetrahydropyranyl‐protected poly( p ‐hydroxystyrene) containing vinyl ether compound for three‐component photopolymers
Author(s) -
Song Soyoung,
Chang Shunping,
Takahara Shigeru,
Yamaoka Tsuguo
Publication year - 1998
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/(sici)1099-1581(199809)9:9<579::aid-pat816>3.0.co;2-5
Subject(s) - photopolymer , materials science , alkoxy group , vinyl ether , polymer chemistry , propane , sulfonate , ether , organic chemistry , chemistry , polymer , copolymer , polymerization , composite material , alkyl , sodium , metallurgy
Poly(p‐hydroxystyrene)s (PHSs) partially protected by tetrahydropyranyl (THP), PPT‐x, containing 2,2′‐bis(4‐(2‐(vinyloxy)ethoxy)phenyl)propane as a crosslinking agent were used as three‐component photopolymers in combination with diphenyliodonium 9,10‐dimethoxyanthracene‐2‐sulfonate (DIAS) as a photoacid generator. The PPT‐x with a higher THP‐protecting ratio was deprotected at higher temperatures than the PPT‐x with a lower THP‐protecting ratio. The conversions of vinyl ether compound in the photopolymer films were not related to the THP‐protecting ratios in PPT‐x and increased with increasing baking time. Under different THP‐protecting ratios and prebaking temperatures, the PPT‐x showed varying lithographic behavior between a positive‐working mode and a negative‐working mode. These three‐component photopolymer solutions of PPT‐x have good preservation stability. © 1998 John Wiley & Sons, Ltd.