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Plasma reactions of self‐assembled monolayers to model oxygen atom effects on polymers
Author(s) -
Elms Fiona M.,
George Graeme A.
Publication year - 1998
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/(sici)1099-1581(199801)9:1<31::aid-pat731>3.0.co;2-a
Subject(s) - monolayer , x ray photoelectron spectroscopy , polymer , plasma , materials science , substrate (aquarium) , oxygen , self assembled monolayer , plasma etching , etching (microfabrication) , atom (system on chip) , oxygen atom , chemical engineering , photochemistry , nanotechnology , chemistry , layer (electronics) , organic chemistry , molecule , composite material , physics , quantum mechanics , computer science , engineering , embedded system , oceanography , geology
The plasma treatment of self‐assembled monolayers of octadecyl mercaptan on gold substrates has been investigated as a model for oxygen atom effects on polymers. Both O 2 and H 2 O low pressure gas plasmas have been used. X‐ray photoelectron spectroscopy has revealed that the two plasma treatments differ from each other in the extent of oxidation and etch rate with O 2 being the more aggressive plasma. The results have confirmed that the plasma modification of organic surfaces involves a balance between surface oxidation and surface etching. The well‐defined structure of the monolayer enables quantitation of these atom‐substrate reactions. © 1998 John Wiley & Sons, Ltd.