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Some novel photosensitive diacetylene diurethanes and their mixtures in common polymers
Author(s) -
Valverde Claudia,
Alexandrova Larissa,
Adem Esbaide,
Ogawa Takeshi,
Rao D. V. G. L. N.
Publication year - 1996
Publication title -
polymers for advanced technologies
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.61
H-Index - 90
eISSN - 1099-1581
pISSN - 1042-7147
DOI - 10.1002/(sici)1099-1581(199601)7:1<27::aid-pat486>3.0.co;2-n
Subject(s) - diacetylene , materials science , polymer , polymerization , vinyl acetate , irradiation , methyl methacrylate , polymer chemistry , methacrylate , spin coating , thin film , photochemistry , chemical engineering , copolymer , composite material , nanotechnology , chemistry , nuclear physics , engineering , physics
Some new octa‐3,5‐diynylene diurethanes were prepared using 3‐butyn‐1‐ol, and all were found to be highly light‐sensitive and to undergo topochemical polymerization on exposure to irradiation. The di‐n‐octyldiurethane was mixed with vinyl polymers such as poly(vinyl acetate) and poly(N,N‐dimethylamino‐ethyl methacrylate) and the mixtures were made into thin films by spin coating. The films were then irradiated by an electron beam to polymerize the diacetylene. The purple films thus obtained showed third‐order nonlinear susceptibility, χ (3) , of the order of 10 −10 –10 −11 e.s.u.