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Synthesis of silicon‐based polymer films by excimer laser‐induced photo‐reaction of phenylsilane and methylphenylsilane
Author(s) -
Suzuki Masaaki,
Nishimura Okio,
Nagai Hideaki,
Nakata Yoshinori,
Okutani Takeshi
Publication year - 2000
Publication title -
applied organometallic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.53
H-Index - 71
eISSN - 1099-0739
pISSN - 0268-2605
DOI - 10.1002/(sici)1099-0739(200006)14:6<325::aid-aoc993>3.0.co;2-n
Subject(s) - phenylsilane , chemistry , excimer laser , silicon , excimer , polymer , photochemistry , laser , chemical engineering , polymer chemistry , organic chemistry , optics , catalysis , physics , engineering
The synthesis of silicon‐based polymer films was studied by excimer laser (248 nm)‐induced photo‐reaction of phenylsilane and methyl‐phenylsilane at reduced pressure. IR and UV–VIS results showed that the films were composed of Si–C network structures with phenyl rings. Copyright © 2000 John Wiley & Sons, Ltd.