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Synthesis and characterization of methylcyclopentadienyl‐( η 3 ‐allyl)platinum and its use as a metallo‐organic chemical vapour deposition precursor of platinum
Author(s) -
Rossetto G.,
Zanella P.,
Carta G.,
Bertani R.,
Favretto D.,
Ingo G. M.
Publication year - 1999
Publication title -
applied organometallic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.53
H-Index - 71
eISSN - 1099-0739
pISSN - 0268-2605
DOI - 10.1002/(sici)1099-0739(199907)13:7<509::aid-aoc868>3.0.co;2-t
Subject(s) - chemistry , platinum , chemical vapor deposition , metalorganic vapour phase epitaxy , deposition (geology) , characterization (materials science) , organic chemistry , inorganic chemistry , nanotechnology , catalysis , materials science , epitaxy , layer (electronics) , sediment , biology , paleontology
This communication reports on rapid, efficient synthesis of the metal‐organic chemical vapor deposition (MOCVD) precursor (methylcyclopentadienyl)allylplatinum. The compound is shown to be an effective precursor for the deposition of platinum thin films giving deposits of high quality and purity, probably due to the nature of ligands which seems to be good leaving groups as confirmed by mass spectrometric path‐way. Copyright © 1999 John Wiley & Sons, Ltd.