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Quantum yield and carbon contamination in thin‐film deposition reaction by core‐electron excitations
Author(s) -
Imaizum Yoshiaki,
Mekaru Harutaka,
Urisu Tsuneo
Publication year - 1999
Publication title -
applied organometallic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.53
H-Index - 71
eISSN - 1099-0739
pISSN - 0268-2605
DOI - 10.1002/(sici)1099-0739(199903)13:3<195::aid-aoc852>3.0.co;2-5
Subject(s) - chemistry , quantum yield , auger electron spectroscopy , desorption , yield (engineering) , excitation , thin film , electron , valence electron , synchrotron radiation , carbon fibers , deposition (geology) , atomic physics , analytical chemistry (journal) , nanotechnology , adsorption , fluorescence , optics , metallurgy , materials science , composite number , engineering , composite material , biology , paleontology , quantum mechanics , nuclear physics , physics , sediment , electrical engineering , chromatography
The excitation energy dependence of the reaction quantum yield and the carbon contamination in synchrotron radiation‐stimulated aluminum thin‐film deposition using the low‐temperature condensed layer of dimethylaluminum hydride (DMAH) were evaluated quantitatively in the vacuum ultraviolet region for the first time. It has been found that the core‐electron excitation gives a few tens to hundreds of times higher a reaction quantum yield than the valence‐electron excitations. This is explained qualitatively by the Auger‐stimulated desorption model. The carbon contamination decreases due to a site‐specific effect of the core‐electron excitations. Copyright © 1999 John Wiley & Sons, Ltd.