Premium
Degradation of organoarsenic compounds by a hydrothermal or photo‐oxidation process
Author(s) -
Maeda Shigeru,
Ohki Akira,
Kawabata Takanori,
Kishita Mayumi
Publication year - 1999
Publication title -
applied organometallic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.53
H-Index - 71
eISSN - 1099-0739
pISSN - 0268-2605
DOI - 10.1002/(sici)1099-0739(199902)13:2<121::aid-aoc805>3.0.co;2-o
Subject(s) - chemistry , arsenate , degradation (telecommunications) , hydrothermal circulation , arsenic , nuclear chemistry , nitro , inorganic chemistry , organic chemistry , chemical engineering , telecommunications , alkyl , computer science , engineering
The degradation of organoarsenic compounds by a hydrothermal process and by photo‐oxidation was studied. When 4‐aminophenylarsonic acid (4‐APA) was treated hydrothermally, almost complete degradation into an inorganic arsenic compound (arsenate, IA) was attained by use of 1.0– 3.0 M NaOH solution at 200 °C. Phenylarsonic acid derivatives which had nitro or hydroxy substituents on the phenyl ring were rather more efficiently degraded than those with amino‐substituents. Compared with phenylarsonic acid derivatives with those functional groups, phenylarsonic acid (PA) and dimethylarsinic acid (DMA) were hard to degrade. On the other hand, DMA was effectively degraded into IA by TiO 2 ‐catalyzed photo‐oxidation, whereas for PA and 4‐APA the photo‐oxidation treatment was not efficient. Copyright © 1999 John Wiley & Sons, Ltd.