Premium
Micropattern of GeO 2 /GeC lines prepared by UV irradiation and heat treatment of polygermane copolymers of methylphenylgermylene/phenylgermyne units
Author(s) -
Mochida Kunio,
Nagano Shuhsaku,
Kawata Hiroki,
Wakasa Masanobu,
Hayashi Hisaharu
Publication year - 1997
Publication title -
applied organometallic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.53
H-Index - 71
eISSN - 1099-0739
pISSN - 0268-2605
DOI - 10.1002/(sici)1099-0739(199712)11:12<949::aid-aoc653>3.0.co;2-#
Subject(s) - copolymer , germanium , homolysis , chemistry , irradiation , ultraviolet , radical , photochemistry , photodissociation , polymer chemistry , carbide , flash photolysis , ultraviolet irradiation , polymer , materials science , organic chemistry , silicon , kinetics , optoelectronics , physics , nuclear physics , quantum mechanics , reaction rate constant
Upon ultraviolet irradiation of polygermane copolymers of methylphenylgermylene/phenylgermyne units (PhMeGe) n (PhGe) m in air, the germanium–germanium bond in the copolymer film changed into a digermoxane chain. Laser flash photolysis of the copolymer film showed the intermediacy of polygermyl radicals generated by Ge–Ge bond homolysis. The XPS showed the formation of germanium carbide (GeC) and germanium dioxide (GeO 2 ) upon heating the unirradiated and irradiated copolymer (PhMeGe) n (PhGe) m films, respectively. A relatively high‐resolution micro‐ pattern of GeC/GeO 2 was obtained by combining the photochemical and thermal properties of the copolymers of methylphenylgermylene/phenylgermyne units. © 1997 John Wiley & Sons, Ltd.