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The Formation of a Solid from the Reaction SiCl 4 (g) + O 2 (g) → SiO 2 (s) + 2Cl 2 (g)
Author(s) -
Binnewies Michael,
Jug Karl
Publication year - 2000
Publication title -
european journal of inorganic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.667
H-Index - 136
eISSN - 1099-0682
pISSN - 1434-1948
DOI - 10.1002/(sici)1099-0682(200006)2000:6<1127::aid-ejic1127>3.0.co;2-6
Subject(s) - chemistry , silicon , oxygen , molecule , combustion , chloride , solid solution , inorganic chemistry , photochemistry , organic chemistry
The formation of a solid by the reaction of small gaseous molecules during a CVD or CVT experiment is a highly complicated process. In the case of the combustion of silicon(IV) chloride in oxygen, which leads to solid silicon dioxide, hundreds of intermediate chlorosiloxanes have been detected. On the basis of their compositions, structures, and stabilities, growth mechanisms of Si–O networks can be derived. The stepwise formation of solid SiO 2 can be described in terms of three basic reactions: (i) formation of highly reactive O=SiCl 2 , (ii) insertion of O=SiCl 2 into an Si–Cl bond, and (iii) thermally induced elimination of SiCl 4 from the resulting chlorosiloxanes.