Open AccessNovel photosensitive polymer based on polycarbodiimide and photoamine generator
Author(s) -
Mochizuki Amane,
Sakamoto Michie,
Yoshioka Masahiro,
Fukuoka Takahiro,
Takeshi Kazumasa,
Ueda Mitsuru
Publication year - 2000
Publication title -
journal of polymer science part a: polymer chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.768
H-Index - 152
eISSN - 1099-0518
pISSN - 0887-624X
DOI - 10.1002/(sici)1099-0518(20000115)38:2<329::aid-pola7>3.0.co;2-7
Subject(s) - polymer chemistry , carbodiimide , chemistry , condensation polymer , moiety , polymer , prepolymer , amine gas treating , catalysis , polyurethane , organic chemistry
A novel photosensitive polymer based on end‐capped polycarbodiimide (E‐PCD) and the photoamine generator N ‐{[(4,5‐dimethoxy‐2‐nitrobenzyl)oxy]carbonyl}‐2,6‐dimethylpiperidine (1) was developed. The E‐PCD was prepared by polycondensation of tolylene‐2,4‐diisocyanate in the presence of 3‐methy‐1‐phenyl‐2‐phospholene‐1‐oxide as a catalyst. The reaction of carbodiimide and secondary amine was studied. The nucleophilic addition of amine to the carbodiimide moiety proceeded smoothly and provided a guanidine base that acted as a crosslinking agent. A lithographic evaluation of the system of E‐PCD and 1 revealed that the dissolution rate of the exposed area after the postexposure bake decreased drastically, although no obvious change of the dissolution rate in the unexposed area was observed. The E‐PCD containing 10 wt % 1 functioned as a negative working photosensitive polymer when it was exposed to 365‐nm UV light, postbaked at 120 °C for 5 min, and developed with toluene at 25 °C. © 2000 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 38: 329–336, 2000