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Microwave planar antenna with RF‐sputtered indium tin oxide films
Author(s) -
Outaleb N.,
Pinel J.,
Drissi M.,
Bonnaud O.
Publication year - 2000
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/(sici)1098-2760(20000105)24:1<3::aid-mop2>3.0.co;2-h
Subject(s) - materials science , indium tin oxide , microwave , optoelectronics , planar , tin , indium , antenna (radio) , electrical engineering , nanotechnology , thin film , telecommunications , engineering , metallurgy , computer science , computer graphics (images)
A transparency printed antenna realized with indium in oxide films (ITO) is investigated. ITO films are deposited on a glass substrate by reactive RF sputtering. A microstrip antenna is rigorously analyzed and optimized, with a full‐wave approach, to operate at 5.8 GHz. The obtained theoretical results are compared to the measured ones, where a satisfactory agreement confirms the validity of the proposed technology for microwave applications. © 2000 John Wiley & Sons, Inc. Microwave Opt Technol Lett 24: 3–7, 2000.