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The steady‐state and transient characteristic analysis of thermal fixing a photorefractive hologram grating in lithium niobate
Author(s) -
Li Jianlang,
Liu Liren,
Guo Yingchun,
Wang Huaisheng,
Zhou Changhe
Publication year - 1999
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/(sici)1098-2760(19991220)23:6<372::aid-mop17>3.0.co;2-j
Subject(s) - photorefractive effect , lithium niobate , grating , optics , materials science , holography , microwave , transient (computer programming) , charge carrier , thermal , diffusion , optoelectronics , physics , quantum mechanics , meteorology , computer science , thermodynamics , operating system
The transient interaction between a refraction index grating and light beams during simultaneous writing and thermal fixing of a photorefractive hologram is investigated. With a diffusion‐ and photovoltaic‐dominated carrier transport mechanism and carrier thermal activation (temperature dependent) considered in Fe:LiNbO 3 crystal, from the standpoint of field–material coupling, the theoretical thermal fixing time and the space‐charge field buildup, spatial distribution, and temperature dependence are given numerically by combining the band transport model with mobile ions with the coupled‐wave equation. ©1999 John Wiley & Sons, Inc. Microwave Opt Technol Lett 23: 372–376, 1999.