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Optimization of LC circuit parameters for obtaining maximum output of a copper vapor laser by a genetic algorithm
Author(s) -
Cheng Cheng,
He Sailing
Publication year - 1999
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/(sici)1098-2760(19990905)22:5<343::aid-mop15>3.0.co;2-2
Subject(s) - copper vapor laser , genetic algorithm , capacitance , laser , copper , microwave , power (physics) , materials science , laser power scaling , lc circuit , analytical chemistry (journal) , chemistry , optoelectronics , physics , engineering , optics , electrical engineering , mathematics , electrode , voltage , chromatography , telecommunications , capacitor , mathematical optimization , thermodynamics , metallurgy
To obtain the maximum output power of a copper vapor laser, the LC parameter configuration of a discharge circuit is optimized by applying a genetic algorithm. The optimized LC parameter configuration is found to be C d =7.26 nF, C p =6.74 nF, L d =1.28 μH, and L p =0.32 μH. The laser power has been increased by 15% under the optimized LC configuration, compared to the empirical LC configuration used in an experiment. The effect of the capacitance ratio C d / C p on the maximum laser output is also investigated. ©1999 John Wiley & Sons, Inc. Microwave Opt Technol Lett 22: 343–348, 1999.