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2‐D numerical simulation of laser‐induced plasma
Author(s) -
Shen Z. H.,
Wen W. Z.,
Lu J.,
Ni X. W.
Publication year - 1998
Publication title -
microwave and optical technology letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.304
H-Index - 76
eISSN - 1098-2760
pISSN - 0895-2477
DOI - 10.1002/(sici)1098-2760(19981205)19:5<354::aid-mop13>3.0.co;2-0
Subject(s) - rotational symmetry , plasma , laser , computer simulation , microwave , silicon , physics , optics , numerical analysis , computational physics , mechanics , atomic physics , mathematics , mathematical analysis , optoelectronics , quantum mechanics
In this paper, second‐order accurate upwind schemes of the total variation diminishing (TVD) type are employed for numerically calculating axisymmetric silicon plasma field interactions induced by a Q ‐switched Nd:YAG laser. The numerical results are in good agreement with the experimental results. © 1998 John Wiley & Sons, Inc. Microwave Opt Technol Lett 19: 354–358, 1998.