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Modification of negative auto‐photosensitive polyimide
Author(s) -
Li JiaShen,
Li ZuoBang,
Zhu PuKun
Publication year - 2000
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(20000725)77:4<943::aid-app31>3.0.co;2-g
Subject(s) - polyimide , diamine , moiety , materials science , polymer chemistry , silicone , monomer , condensation polymer , dielectric , absorption (acoustics) , ultraviolet , composite material , chemistry , polymer , organic chemistry , layer (electronics) , optoelectronics
This article describes the preparation of a kind of auto‐photosensitive polyimide (PSPI) that contains organo‐silicone moiety in its main chain. A group of novel auto‐photosensitive polyimides were prepared based on the aromatic diamine monomers and 3,3′,5,5′‐benzophenontetracarboxylic dianhydride (BTDA) by the method of solution polycondensation at room temperature and imidized at a high temperature. The properties of PSPIs, such as ultraviolet (UV) absorption, electric and adhesion properties, and moisture absorption, were characterized by UV analysis, a dielectric constant detector, and so on. The relationship between the structure and properties of PSPIs is discussed. © 2000 John Wiley & Sons, Inc. J Appl Polym Sci 77: 943–947, 2000