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Structure and effect of pyrolisis on plasma polymerized polyfuran thin films
Author(s) -
Kumar D. Sakthi
Publication year - 2000
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(20000228)75:9<1176::aid-app11>3.0.co;2-p
Subject(s) - polymerization , polymer , monomer , annealing (glass) , plasma polymerization , materials science , polymer chemistry , plasma , thin film , composite material , nanotechnology , physics , quantum mechanics
As part of our attempt to make semiconducting polymers from the plasma polymerized polymers, we have polymerized Furan and annealed the polymerized film under different annealing conditions. It is noted that the current density is increased by one order when the sample is annealed in the presence of air, and in the case of vacuum annealed sample, the current density decreased in comparison with the unannealed sample. The probable reason for this difference is also discussed. Comparative study of the infrared spectra of the monomer and polymer gives some hints regarding the structure of the polymer unit. © 2000 John Wiley & Sons, Inc. J Appl Polym Sci 75: 1176–1179, 2000