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Space–charge‐limited conduction in vacuum‐deposited PVDF films
Author(s) -
Bodhane S. P.,
Shirodkar V. S.
Publication year - 1999
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19991107)74:6<1347::aid-app4>3.0.co;2-k
Subject(s) - space charge , materials science , ohmic contact , thermal conduction , activation energy , evaporation , vacuum evaporation , voltage , vacuum deposition , polymer , composite material , thin film , electrical engineering , nanotechnology , chemistry , physics , electron , thermodynamics , organic chemistry , engineering , layer (electronics) , quantum mechanics
Current–voltage characteristics of poly(vinylidene fluoride) (PVDF) films fabricated on glass substrates by thermal evaporation technique in the metal–polymer–metal sandwich configuration were studied. The vacuum‐deposited PVDF films were predominantly of α form. However, when subjected to high‐voltage, short‐duration singular pulse, it possibly resulted in mixed α + β form. The I – V curves of such films display the low‐field ohmic region and the high‐field square‐law region. The current versus thickness curves in the square‐law region and the transition voltage, V tr , versus thickness curves indicate the conduction process to be space–charge‐limited. The analyses of the current–voltage characteristics indicated the presence of uniformly distributed high‐trapping carrier densities on the order of 10 24 m −3 eV −1 with average activation energy of 0.263 eV. © 1999 John Wiley & Sons, Inc. J Appl Polym Sci 74: 1347–1354, 1999