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Preparation and characteristics of thin film with wear‐resistant behavior on HDPE surface polymerized by C 2 H 2 –H 2 –SiH 4 plasma
Author(s) -
Zou Xiangping,
Yi Xiaosu,
Fang Zhenkui
Publication year - 1998
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19981121)70:8<1561::aid-app13>3.0.co;2-5
Subject(s) - thin film , high density polyethylene , silane , materials science , x ray photoelectron spectroscopy , acetylene , polyethylene , plasma polymerization , polymerization , composite material , deposition (geology) , substrate (aquarium) , polymer chemistry , adhesive , infrared spectroscopy , chemical engineering , layer (electronics) , organic chemistry , chemistry , nanotechnology , polymer , paleontology , oceanography , sediment , geology , engineering , biology
Plasma‐polymerized deposition of an acetylene–hydrogen–silane mixture (C 2 H 2 –H 2 –SiH 4 ) to obtain thin film with good wear behavior on a high‐density polyethylene (HDPE) surface was present in this work. It was found that the bond between thin film and HDPE substrate was excellent and H 2 gas in system led the deposited thin film to better adhesive properties, but slower thin film deposition rate. Surface wear‐resistant properties of modified HDPE were improved with the input of SiH 4 . Infrared and X‐ray photoelectron spectroscopy spectra suggested that there be large quantities of >CO, OH, CSi, and SiO groups in thin film and that the ratio of C to Si was increased due to the addition of SiH 4 and H 2 , which inferred that the thin film structure and components lie between organic and inorganic materials. © 1998 John Wiley & Sons, Inc. J Appl Polym Sci 70: 1561–1566, 1998