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Photodegradation of teflon AF1600 during XPS analysis
Author(s) -
Popovici D.,
Sacher E.,
Meunier M.
Publication year - 1998
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19981107)70:6<1201::aid-app17>3.0.co;2-1
Subject(s) - homolysis , x ray photoelectron spectroscopy , radical , bond cleavage , photodegradation , polymer chemistry , degradation (telecommunications) , peroxide , reaction mechanism , photochemistry , chemistry , anode , materials science , organic chemistry , catalysis , physics , nuclear magnetic resonance , electrode , telecommunications , photocatalysis , computer science
Teflon AF1600, containing perfluorinated dioxole rings, was found to be particularly susceptible to X‐ray degradation, such as that occurring during X‐ray photoelectron spectroscopy. Because of the presence of O, the degradation mechanism is substantially different from those of fluoropolymers containing only C and F. Each atom of a given element was found to have the same susceptibility to attack, irrespective of its position in the repeat unit, with O at least twice as susceptible as F. At any dose between 60 W* X‐ray source power/5 min and 240 W/40 min, O was lost at an amount equal to that of F, which necessitated the breaking of two C—O bonds; O also degraded by breaking only one bond, in which case the oxygen was not lost but formed a free radical. The free radicals produced by the homolytic scission of C—C bonds participated in reactions leading to degradation and crosslinking. *The product of X‐ray filament emission current and the potential difference between it and the X‐ray anode. © 1998 John Wiley & Sons, Inc. J. Appl. Polym. Sci. 70: 1201–1207, 1998