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Photooxidative degradation of styrenic polymers: 13 C‐NMR and morphological changes upon irradiation
Author(s) -
Prasad A. Vishwa,
Singh R. P.
Publication year - 1998
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19981024)70:4<637::aid-app2>3.0.co;2-r
Subject(s) - copolymer , styrene , polystyrene , scanning electron microscope , polymer , materials science , irradiation , polymer chemistry , chain scission , chemical engineering , composite material , physics , nuclear physics , engineering
Thin films of high impact polystyrene (HIPS 8350) and styrene–butadiene–styrene triblock copolymers (SBS) were exposed to polychromatic light for different time intervals in SEPAP 12/24 at 55°C in atmospheric air. The photooxidized samples were analyzed by 13 C‐NMR spectroscopy in the liquid state. Epoxides and alcohols were photoproducts in the SBS. Epoxides were not observed in the HIPS. The morphological changes of the solution cast HIPS and SBS films caused by irradiation were studied by scanning electron microscopy. The property deterioration was explained in terms of scission reactions in the HIPS and SBS matrix. The micrographs indicate that both materials are of a two phasic system. © 1998 John Wiley & Sons, Inc. J. Appl. Polym. Sci. 70: 637–645, 1998