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Preparation and characterization of plasma‐polymerized thiophene films
Author(s) -
Bhat N. V.,
Wavhal D. S.
Publication year - 1998
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19981003)70:1<203::aid-app20>3.0.co;2-6
Subject(s) - polythiophene , amorphous solid , polymerization , materials science , thiophene , electrical resistivity and conductivity , analytical chemistry (journal) , plasma polymerization , deposition (geology) , conductive polymer , conductivity , polymer chemistry , infrared spectroscopy , chemical engineering , polymer , chemistry , composite material , crystallography , organic chemistry , paleontology , sediment , electrical engineering , biology , engineering
Plasma polymerization of thiophene was carried out in a tubular reactor using an rf source. Various substrates such as aluminum, glass, and NaCl crystal were used. The rate of deposition attained an equilibrium value of 0.35 μg cm −2 s −1 . Infrared spectra revealed the formation of polythiophene. The films were found to be highly crosslinked. The electrical conductivity was found to be very low (10 −15 –10 −10 S/cm). The mode of electrical conduction was found to be space charge‐limited current. SEM studies showed that the films consist of globules, the size of which varied from 1 to 10 μ depending on the time of deposition. X‐ray diffraction studies revealed the films to be highly amorphous. © 1998 John Wiley & Sons, Inc. J. Appl. Polym. Sci. 70: 203–209, 1998