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Effect of penta‐ and tetramethyl HALS on the radiation resistance of polypropylene
Author(s) -
Wang Huiliang,
Chen Wenxiu
Publication year - 1998
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19980926)69:13<2649::aid-app15>3.0.co;2-p
Subject(s) - styrene , copolymer , polymer chemistry , methacrylate , methacrylic acid , methyl methacrylate , thermal stability , polypropylene , monomer , chemistry , radiation resistance , acrylic acid , materials science , polymer , organic chemistry , irradiation , physics , nuclear physics
2,2,6,6‐Tetramethyl‐4‐piperidinyl methacrylate (TMPM), a new pentamethyl HALS 1,2,2,6,6‐pentamethyl‐4‐piperidinyl methacrylate (PMPM), their homopolymers (PTMPM and PPMPM), and their copolymers, [i.e., TMPM or PMPM copolymerized with monomers methyl methacrylate (MMA), methacrylic acid (MAA), acrylic acid (AA), and styrene (St) separately] were synthesized. PMPM shows an extremely excellent stabilizing effectiveness on improving the radiation resistance of polypropylene (PP) in comparison with other low molecular weight (LMW) HALS or polymeric HALS. Polymeric HALS shows a much higher thermal stability and better extraction resistance than that of LMW HALS. It is found that the Eb values of the PP‐added pentamethyl HALS series are higher than those of PP with the corresponding tetramethyl HALS series at a given irradiation dose. A conclusion can be drawn that the pentamethyl HALS series has a higher stabilizing effectiveness than that of the tetramethyl HALS series. © 1998 John Wiley & Sons, Inc. J. Appl. Polym. Sci. 69: 2649–2656, 1998