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Dimensionally stable polyimide copolymers for microelectronics applications
Author(s) -
Fay Catharine C.,
St. Clair Anne K.
Publication year - 1998
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19980919)69:12<2383::aid-app10>3.0.co;2-z
Subject(s) - microelectronics , materials science , polyimide , thermal stability , composite material , ultimate tensile strength , thermal expansion , copolymer , polymer chemistry , polymer , chemistry , nanotechnology , organic chemistry , layer (electronics)
Polyimides are finding increased applications in microelectronics due to their high thermal stability, good chemical resistance, good adhesion, low moisture absorption, good mechanical properties, and low coefficient of thermal expansion (CTE). Four series of random copolyimides were synthesized and characterized for potential application as encapsulants, stress‐relief layers, and interlevel dielectrics. Several candidates exhibited good combinations of physical and mechanical properties with inherent viscosities from 1.21 to 1.42 dL/g, T g 's ranging from 251 to 277°C, 10% weight loss temperatures between 503 and 527°C, and CTEs ranging from 33 to 39 ppm/°C. Mechanical properties at room temperature for the best candidates included tensile strengths of 17.8–21.3 ksi, moduli between 388 and 506 ksi, and elongations of 11–43%. Moisture absorption for these copolyimides ranged between 0.85 and 1.38 wt %. © 1998 John Wiley & Sons, Inc. J Appl Polym Sci 69: 2383–2393, 1998