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The conductive behavior and structural characteristics in the I + ‐beam‐implanted layer of plasma‐polymerized pyrrole film
Author(s) -
Tong Zhi Shen,
Wu Mei Zhen,
Pu Tian Shu,
Zhang Zheng Yang,
Zhang Jing,
Jin Ruo Peng,
Zhu De Zhang,
Zhu Fu Ying,
Cao De Xin,
Cao Jian Qing
Publication year - 1998
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19980829)69:9<1743::aid-app8>3.0.co;2-b
Subject(s) - x ray photoelectron spectroscopy , materials science , fluence , doping , layer (electronics) , polymerization , analytical chemistry (journal) , plasma , polypyrrole , infrared spectroscopy , pyrrole , ultraviolet , spectroscopy , electrical conductor , ion implantation , surface layer , ion , polymer chemistry , chemistry , chemical engineering , optoelectronics , composite material , polymer , organic chemistry , physics , quantum mechanics , engineering
A dense organic film was prepared by plasma polymerization of pyrrole. A 20 keV I + implantation at a fluence of 1 × 10 16 ions cm −2 was used to produce a conducting surface layer due to doping. The characteristics of the implanted layer have been investigated using ion beam analysis techniques, X‐ray photoelectron spectroscopy, and near‐infrared to ultraviolet spectroscopy. The charge carriers transport in this implanted layer was also analyzed in the temperature region of 120 to 297 K. © 1998 John Wiley & Sons, Inc. J. Appl. Polym. Sci. 69: 1743–1751, 1998