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Infrared spectroscopic study of SiO x film formation and decomposition of vinyl silane derivative by heat treatment. I. On KBr and gold surface
Author(s) -
Kim Hyuncheol,
Jang Jyongsik
Publication year - 1998
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/(sici)1097-4628(19980502)68:5<775::aid-app9>3.0.co;2-l
Subject(s) - copolymer , silane , infrared spectroscopy , fourier transform infrared spectroscopy , polymer chemistry , thermal decomposition , materials science , attenuated total reflection , absorption spectroscopy , decomposition , infrared , chemistry , analytical chemistry (journal) , chemical engineering , organic chemistry , polymer , composite material , optics , physics , engineering
The free‐radical copolymerization of vinyltrimethoxysilane (VTS) with vinylimidazole (VI) was carried out in benzene at 68°C. Thermooxidative degradation and the SiO x film‐formation mechanism of poly(VI‐ co ‐VTS) both on gold and KBr were studied with Fourier transform infrared (FTIR) spectroscopy. Reflection‐absorption (R‐A) spectra on gold were compared with transmission spectra on KBr. In the initial stage of heat treatment, the Si—O—Si bond formation was caused mainly by the residual water in the copolymer film. As heating time increased, however, both the water resulting from the thermal decomposition of the copolymer and the water vapor in air began to participate in the hydrolysis of the Si—O—CH 3 group followed by the condensation reaction. The structure of the SiO x film became closer to the structure of SiO 2 with increasing heating temperature. In addition, the differences between the transmission spectra and R‐A spectra were observed at the peaks related to Si—O—Si stretching due to the optical effect. © 1998 John Wiley & Sons, Inc. J Appl Polym Sci 68:775–784, 1998